Mitutoyo 378-809-5 M Plan Apo NUV 10X Objective for bright-field observation in near ultraviolett range

The M Plan Apo NUV 10X is a precision plan apochromat objective designed for bright field inspection and laser applications requiring performance in the near-ultraviolet range. With wavelength correction from the visible spectrum down to 355 nm (Near-UV), this objective is well suited for advanced inspection, analytical imaging, and laser process monitoring applications.

Featuring an extended 30.5 mm working distance, the lens provides excellent clearance for larger or uneven samples while maintaining strong optical performance. Its high-quality plan apochromat design ensures flat-field imaging and superior chromatic correction across the extended wavelength range.

The infinity-corrected optical system allows seamless integration with compatible microscope platforms, including VMU and FS-70 systems. A High Resolution (HR) version is available within the NUV range for applications requiring enhanced resolving performance.

Key Features

Suitable for bright field inspection and laser applications

Wavelength correction from 355–620 nm (Visible to Near-UV)

High-quality Plan Apochromat optical design

Extra-long working distance design

Infinity corrected

HR (High Power) version available

Specifications

Model: M Plan Apo NUV 10X

Magnification: 10x

Working distance (in air): 30.5 mm

Numerical Aperture (N.A.): 0.28

Corrected wavelength range: 355–620 nm

Resolving power: 1 µm

Depth of focus: 3.5 µm

Field of view (ø24 mm eyepiece): ø2.4 mm

Field of view (1/2” camera chip): 0.48 × 0.64 mm

Parfocal distance (P.D.): 95 mm

Spectral range: Near-UV (NUV)

Observation mode: Brightfield

Glass compensation: No

High Resolution: No (HR version available)

Laser applications: Yes

Mass: 255 g