Mitutoyo 378-817-8 M Plan Apo NUV 20X Objective for bright-field observation in near ultraviolett range

The M Plan Apo NUV 20X is a precision plan apochromat objective developed for bright field inspection and laser applications requiring near-ultraviolet capability. With wavelength correction from the visible spectrum down to 355 nm (Near-UV), it is well suited for advanced inspection, analytical imaging, and laser process monitoring.

Featuring a long 17 mm working distance, this objective provides excellent sample clearance while maintaining strong optical performance. The high-quality plan apochromat design ensures flat-field imaging and superior chromatic correction across the extended wavelength range.

Its infinity-corrected optical system allows seamless integration with compatible microscope platforms, including VMU and FS-70 systems. A High Resolution (HR) version is available within the NUV range for applications requiring enhanced resolving performance.

Key Features

Suitable for bright field inspection and laser applications

Wavelength correction from 355–620 nm (Visible to Near-UV)

High-quality Plan Apochromat optical design

Long working distance design

Infinity corrected

HR (High Power) version available

Specifications

Model: M Plan Apo NUV 20X

Magnification: 20x

Working distance (in air): 17 mm

Numerical Aperture (N.A.): 0.42

Corrected wavelength range: 355–620 nm

Resolving power: 0.7 µm

Depth of focus: 1.7 µm

Field of view (ø24 mm eyepiece): ø1.2 mm

Field of view (1/2” camera chip): 0.24 × 0.32 mm

Parfocal distance (P.D.): 95 mm

Spectral range: Near-UV (NUV)

Observation mode: Brightfield

Glass compensation: No

High Resolution: No (HR version available)

Laser applications: Yes

Mass: 350 g