Mitutoyo 378-819-15 M Plan Apo NUV 100x Objective for bright-field observation in near-ultraviolet range

The M Plan Apo NUV 100X is a high-performance plan apochromat objective designed for bright field inspection and laser applications requiring near-ultraviolet capability. With wavelength correction from the visible spectrum down to 355 nm (Near-UV), this objective is ideally suited for advanced inspection, analytical imaging, and laser process monitoring applications.

Its long 11 mm working distance provides practical clearance at high magnification, while maintaining strong optical performance. The infinity-corrected plan apochromat design ensures flat-field imaging and excellent chromatic correction across the extended wavelength range.

Compatible with VMU and FS-70 microscope systems, the M Plan Apo NUV 100X offers reliable near-UV imaging performance for precision observation tasks.

Key Features

Suitable for bright field inspection and laser applications

Wavelength correction from 355–620 nm (Visible to Near-UV)

High-quality Plan Apochromat optical design

Long working distance design

Infinity corrected

HR (High Power) type available within the NUV range

Specifications

Model: M Plan Apo NUV 100X

Magnification: 100x

Working distance (in air): 11 mm

Numerical Aperture (N.A.): 0.5

Corrected wavelength range: 355–620 nm

Resolving power: 0.6 µm

Depth of focus: 1.1 µm

Field of view (ø24 mm eyepiece): ø0.24 mm

Field of view (1/2” camera chip): 0.05 × 0.06 mm

Parfocal distance (P.D.): 95 mm

Spectral range: Near-UV (NUV)

Observation mode: Brightfield

Glass compensation: No

High Resolution: No (HR version available in range)

Laser applications: Yes

Mass: 380 g