Mitutoyo 378-822-5 M Plan Apo NIR 5X Objective for bright-field observation in near-infrared range

The M Plan Apo NIR 5X is a precision plan apochromat objective designed for bright field inspection and laser-based applications requiring stable performance across the visible to near-infrared spectrum. With wavelength correction from 480–1800 nm, this objective is ideal for multi-wavelength inspection and NIR laser repair environments.

Engineered with an infinity-corrected optical system, the M Plan Apo NIR 5X maintains image focus within the depth of field even when switching between visible and near-infrared illumination. This makes it particularly suitable for inspection processes where multiple wavelengths are used.

Its extended 37.5 mm working distance provides excellent clearance for larger components and uneven surfaces while maintaining reliable optical performance. A High-Resolving Power (HR) version is available within the M Plan Apo NIR range for applications requiring enhanced resolution.

Note: When operating above 1100 nm, the focusing position may deviate slightly from that in the visible range due to changes in glass dispersion and refractive index.

Key Features

Suitable for bright field inspection and laser-based applications

Wavelength correction from 480–1800 nm (Visible to Near-Infrared)

Designed to maintain focus when switching between visible and NIR wavelengths

High-quality Plan Apochromat optical design

Extra-long working distance design

Infinity corrected

HR (High-Resolving Power) type available

Specifications

Model: M Plan Apo NIR 5X

Magnification: 5x

Working distance (in air): 37.5 mm

Numerical Aperture (N.A.): 0.14

Corrected wavelength range: 480–1800 nm

Resolving power: 2 µm

Depth of field: 14 µm

Field of view (ø24 mm eyepiece): ø4.8 mm

Field of view (1/2” camera chip): 0.96 × 1.28 mm

Parfocal distance (P.D.): 95 mm

Spectral range: Near-Infrared (NIR)

Observation mode: Brightfield

Glass compensation: No

High Resolution: No (HR version available)

Mass: 220 g