Mitutoyo 378-836-7 BD Plan Apo 100X Objective for bright/dark-field observation in visible range

The BD Plan Apo 100X is a high-performance plan apochromat objective designed for both bright field and dark field inspection at high magnification. It is particularly suited for detailed analysis of scratches, concavity, convexity, and fine surface defects, where maximum resolution and contrast are essential.

Featuring an infinity-corrected optical system and correction across the visible wavelength range (436–656 nm), this objective delivers sharp, high-contrast imaging in both bright and dark field modes. With a high numerical aperture of 0.7, it achieves a resolving power of 0.4 µm, making it ideal for precision surface inspection.

The 6 mm working distance provides practical clearance while maintaining excellent optical performance. Designed for use with MF-U and Hyper MF-U microscope systems, the BD Plan Apo 100X offers reliable, high-resolution imaging for advanced industrial and laboratory applications.

Key Features

Suitable for Bright Field and Dark Field inspection

Ideal for detecting scratches, concavity, convexity, and fine surface defects

High-quality Plan Apochromat optical design

Infinity corrected

High numerical aperture for enhanced detail

Optimised for visible wavelength range (436–656 nm)

Specifications

Model: BD Plan Apo 100X

Magnification: 100x

Working distance (in air): 6 mm

Numerical Aperture (N.A.): 0.7

Corrected wavelength range: 436–656 nm

Resolving power: 0.4 µm

Depth of field: 0.6 µm

Field of view (ø24 mm eyepiece): ø0.24 mm

Field of view (1/2” camera chip): 0.05 × 0.06 mm

Spectral range: VIS

Observation mode: Brightfield / Darkfield

Glass compensation: No

Laser applications: No

Mass: 460 g