Mitutoyo 378-864-15 M Plan Apo NIR HR 100X High resolution objective for bright-field observation in near-infrared range

The M Plan Apo NIR HR 100X is a premium plan apochromat objective engineered for bright field inspection and laser-based applications requiring maximum resolution across the visible to near-infrared spectrum.

With wavelength correction from 480–1800 nm (Visible to Near-Infrared), this objective maintains image focus within the focal depth when switching between visible and NIR illumination. This makes the M Plan Apo NIR series especially suitable for laser repair, semiconductor inspection, and multi-wavelength analysis.

As a High-Resolving Power (HR) model, the 100X features a high numerical aperture of 0.70, delivering a resolving power of 0.4 µm and exceptional fine-detail imaging. Its infinity-corrected plan apochromat design ensures flat-field performance and strong chromatic correction across the extended spectral range.

With a 10 mm working distance, the objective balances high magnification with practical clearance for precision inspection tasks.

Note: When operating above 1100 nm, the focusing position may deviate slightly from that in the visible range due to changes in glass dispersion and refractive index.

Key Features

Suitable for bright field inspection and laser-based applications

Wavelength correction from 480–1800 nm (Visible to Near-Infrared)

High-Resolving Power (HR) design

High numerical aperture (0.70) for enhanced detail

High-quality Plan Apochromat optical design

Infinity corrected

Specifications

Model: M Plan Apo NIR HR 100X

Magnification: 100x

Working distance (in air): 10 mm

Numerical Aperture (N.A.): 0.70

Corrected wavelength range: 480–1800 nm

Resolving power: 0.4 µm

Depth of field: 0.6 µm

Field of view (ø24 mm eyepiece): ø0.24 mm

Field of view (1/2” camera chip): 0.05 × 0.06 mm

Parfocal distance (P.D.): 95 mm

Spectral range: Near-Infrared (NIR)

Observation mode: Brightfield

Glass compensation: No

High Resolution: Yes

Mass: 490 g