
- brand Mitutoyo
- type Objective Lens
- mass 500g
- magnification 50x
- working distance 10mm
- numerical aperture 0.65
- working distance 10mm
- focal length 4mm
- resolving power (Microns) 0.42
- focal depth (Microns) 0.65
- view field 1 0.48mm Dia
- view field 2 0.10x0.13mm
The M Plan Apo NUV HR 50X is a premium plan apochromat objective engineered for bright field inspection and laser applications requiring high resolving performance in the near-ultraviolet range. With wavelength correction from the visible spectrum down to 355 nm (Near-UV), it is ideally suited for advanced inspection and laser process monitoring applications.
As a High Resolution (HR) model, this objective delivers exceptional optical performance with a high numerical aperture of 0.65 and a resolving power of 0.42 µm, ensuring sharp detail and strong contrast at high magnification. Its long 10 mm working distance provides practical clearance while maintaining outstanding image quality.
The infinity-corrected plan apochromat design ensures flat-field imaging and excellent chromatic correction across the extended wavelength range. Compatible with VMU and FS-70 microscope systems, the M Plan Apo NUV HR 50X is an ideal solution for precision inspection and demanding near-UV laser applications.
Key Features
Suitable for bright field inspection and laser applications
Wavelength correction from 355–620 nm (Visible to Near-UV)
High-quality Plan Apochromat optical design
High Resolution (HR) / High Power type
Long working distance design
Infinity corrected
Specifications
Model: M Plan Apo NUV HR 50X
Magnification: 50x
Working distance (in air): 10 mm
Numerical Aperture (N.A.): 0.65
Corrected wavelength range: 355–620 nm
Resolving power: 0.42 µm
Depth of focus: 0.65 µm
Field of view (ø24 mm eyepiece): ø0.48 mm
Field of view (1/2” camera chip): 0.1 × 0.13 mm
Parfocal distance (P.D.): 95 mm
Spectral range: Near-UV (NUV)
Observation mode: Brightfield
Glass compensation: No
High Resolution: Yes
Laser applications: Yes
Mass: 550 g